抄録
Barium titanate (BaTiO3) thin films have been prepared in situ on Al/SiO2/Si(100) substrate by backside deposition of intense, pulsed, ion-beam evaporation technique using 1.3MeV, 50ns, 25J/cm2 ion beam. Very smooth surface of the films was obtained, where no droplets appear, The deposition rate was approximately 50nm/shot, which is-10% of the conventional frontside deposition. The films were perovskite polycrystals. The maximum roughness of the surface decreases from 60 to 35nm with increasing substrate temperature from 25 to 350°C, respectively The capacitance of the thin film (at 1kHz) increases from 3 to 10nF/mm2 with increasing substrate temperature from 25 to 250°C, respectively.
