IEEJ Transactions on Fundamentals and Materials
Online ISSN : 1347-5533
Print ISSN : 0385-4205
ISSN-L : 0385-4205
Control of Anisotropy in Etching Process Using Electron-Beam-Excited Plasma
Ryuichi Miyano, Motoyuki Fujii, Shunjiro Ikezawa
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1997 Volume 117 Issue 7 Pages 785-786

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