IEEJ Transactions on Fundamentals and Materials
Online ISSN : 1347-5533
Print ISSN : 0385-4205
ISSN-L : 0385-4205
Comparison of SiO2 Etching Characteristics in DC and RF Magnetron Plasmas.
Hiroshi Yamada, Hiroki Ura, Kiyoshi Kuwahara, Hiroshi Fujiyama
Author information
Keywords: SiO2 etching, magnetron plasma, self-bias, crystal resonator
JOURNAL FREE ACCESS

1999 Volume 119 Issue 4 Pages 490-495

Details
Download PDF (1067K)
Download citation RIS

(compatible with EndNote, Reference Manager, ProCite, RefWorks)

BIB TEX

(compatible with BibDesk, LaTeX)

Text
How to download citation
Contact us
Article 1st page
Content from these authors
© The Institute of Electrical Engineers of Japan
Previous article Next article
Favorites & Alerts

Recently viewed articles
Announcements from publisher
  • A member of IEEJ can access the transactions of the Technical Society to which the member belongs. Please enter the My Page login ID in the subscriber number column and the birth date (year/month/date with one-byte characters: for example, 19800303) in the password column.
Predecessor

The transactions of the Institute of Electrical Engineers of Japan.A

The Journal of the Institute of Electrical Engineers of Japan

Related information

https://www.jstage.jst.go.jp/browse

Related journals
The Journal of The Institute of Electrical Engineers of Japan
IEEJ Transactions on Power and Energy
IEEJ Transactions on Electronics, Information and Systems
IEEJ Transactions on Industry Applications
IEEJ Journal of Industry Applications
IEEJ Transactions on Sensors and Micromachines
IEEJ Transactions on Electrical and Electronic Engineering
Share this page
feedback
 Top