3-D Micro Machining of Photo Sensitive Glass Using Gray-Scale Mask

Abstract

A cost-effective gray-scale mask fabrication technique and three dimensional micromaching of photo sensitive glass has been developed. The gray-scale mask was fabricated with wide use computer apparatus, a 1/20 projector and an emulsion glass mask. Multi level structures can be achieved with one-step photolithography and etching process using a gray-scale mask which is modified with gray-scale patterns to vary the energy of UV-light. High aspect ratio complex 3-D structures with different depths of 0.1mm to 1.5mm have been fabricated by use of this technique. These surfaces of fabricated structures can be made smooth by polysilazane coating. The technique can be applied to fabrication of the elements in optical and biomedical applications.