IEEJ Transactions on Sensors and Micromachines
Online ISSN : 1347-5525
Print ISSN : 1341-8939
ISSN-L : 1341-8939
Paper
RF Characteristics of Through-Hole Interconnections Filled with Au-Sn Solder
Satoshi YamamotoKohei MatsumaruTatsuo Suemasu
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2006 Volume 126 Issue 12 Pages 649-654

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Abstract
Silicon through-hole interconnections filled with Au-Sn solder by Molten Metal Suction Method (MMSM) have been developed. They are expected to realize wafer-level package of various devices such as Micro Electro-Mechanical Systems (MEMS), RF devices and some sensors. In this paper, RF characteristics of the through-hole interconnections were examined. Co-planar type circuits including one signal line and two grand lines were used for the measurement. Each line has two through-hole interconnections connected electrically by Cu wiring. The diameter of the through-holes was 80 μm and the thickness of the substrate was 200 μm, respectively. S-parameter S21 was measured from 0.1 GHz to 8 GHz. The thickness of SiO2 insulation and the resistivity of the Si substrate were especially focused on. Transmission loss of 1.2 μm SiO2 sample at 1 GHz was 0.86 dB and that of 0.1 μm SiO2 sample was 3.7 dB, respectively. On the other hand, the transmission loss of 10 Ωcm sample at 1 GHz was 0.86 dB and that of 1000 Ωcm sample was 0.01 dB, respectively. From these results, it was appeared that RF transmission performance of the Si through-hole interconnections becomes superior as the thickness of SiO2 was thicker and as the resistivity of the Si substrate becomes higher.
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© 2006 by the Institute of Electrical Engineers of Japan
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