Pb(Zr,Ti)O₃薄膜のウエットエッチングにおけるダメージのLaNiO₃導電性酸化物薄膜による低減

抄録

We have investigated the degradation of ferroelectric property of Pb(Zr,Ti)O₃(PZT) thin films derived from wet etching of PZT thin films. We have also investigated the reduction of the degradation with LaNiO₃ (LNO) thin films as a buffer layer between Pt and PZT thin films. The polarization and dielectric constant of the PZT thin films were reduced to about 70% through wet etching. It has found that the degradation can be avoided with LNO thin films.