Hydrogen radical and argon fast atom beam (FAB) treatments were used to remove the oxide layer of copper metal. After the treatments, the copper samples were exposed to air atmosphere (～4 h) at room temperature to evaluate the re-oxidation behavior. Compared to argon FAB treatment, hydrogen radical treatment promotes the formation of copper hydroxide [Cu(OH)2] and suppresses the formation of cuprous oxide (Cu2O) formation.
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