IEEJ Transactions on Sensors and Micromachines
Online ISSN : 1347-5525
Print ISSN : 1341-8939
A HIGH YIELD RELEASING TECHNIQUE BY USING A SILICON OXIDE DIAPHRAGM
Hiroshi ToshiyoshiHiroyuki Fujita
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Volume 116 (1996) Issue 7 Pages 305-306

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Abstract

The diaphragm release technique presented here contributes to improve the processing yield of suspended microstructures. We believe that it extends the range of micromachining application because it is used to structural materials other than polysilicon, and because it is compatible with existing bulk micromachining processes.

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