電気学会論文誌E(センサ・マイクロマシン部門誌)
Online ISSN : 1347-5525
Print ISSN : 1341-8939
ISSN-L : 1341-8939
A HIGH YIELD RELEASING TECHNIQUE BY USING A SILICON OXIDE DIAPHRAGM
Hiroshi ToshiyoshiHiroyuki Fujita
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1996 年 116 巻 7 号 p. 305-306

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The diaphragm release technique presented here contributes to improve the processing yield of suspended microstructures. We believe that it extends the range of micromachining application because it is used to structural materials other than polysilicon, and because it is compatible with existing bulk micromachining processes.

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© The Institute of Electrical Engineers of Japan
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