IEEJ Transactions on Sensors and Micromachines
Online ISSN : 1347-5525
Print ISSN : 1341-8939
ISSN-L : 1341-8939
Deep etching of fluorinated polyimide using an SPP (Silicone-based Positive Photoresist) mask
Takahiro Ito, Hiroshi Koshimizu, Shinsuke Matsui, Renshi Sawada
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Keywords: SPP, M-RIE
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1997 Volume 117 Issue 1 Pages 57-58

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IEEJ Transactions on Industry Applications

IEEJ Transactions on Electronics, Information and Systems

IEEJ Transactions on Power and Energy

IEEJ Transactions on Fundamentals and Materials

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The Journal of The Institute of Electrical Engineers of Japan
IEEJ Transactions on Fundamentals and Materials
IEEJ Transactions on Power and Energy
IEEJ Transactions on Electronics, Information and Systems
IEEJ Transactions on Industry Applications
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IEEJ Transactions on Electrical and Electronic Engineering
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