Deposition Thickness Sensor for Ion Sputtering Apparatus
キーワード:
optical sensor,
quartz core microcantilever,
ion sputtering apparatus,
in situ film thickness measurement
1997 年 117 巻 2 号 p. 105-108
詳細
1997 年 117 巻 2 号 p. 105-108
A quartz core microcantilever fabricated from an optical fiber tip can be utilized for monitoring of deposition thickness. Dynamic monitoring of deposition thickness was performed without influence of electrical noise in an ion sputtering apparatus. Resonance frequencies were measured as a function of deposition time of Au and Ag. Resonance frequency decreased from 11.52kHz to 10.89kHz during a deposition time of 60 minutes which corresponded to a thickness of 360nm in case of Au.
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