3-Dimensional Microstructure Fabrication using Multiple Moving Mask Deep X-ray Lithography Process

抄録

An advanced technology using a multiple moving X-ray mask deep X-ray lithography (M³DXL) to realize various microstructures with inclined or free shape side wall, namely 3-dimensional microstructures, was proposed. The side wall shape of a PMMA microstructure fabricated by deep X-ray lithography has bean controlled by moving X-ray masks in parallel with the PMMA substrate during X-ray exposure. In order to demonstrate the feasibility of this M³DXL technology, various microstructures were successfully fabricated; (1) conical shape and truncated conical shape microstructures with height of 100-300μm and a diameter of 0-310μm and (2) grooves with saw shape cross section with depth of about 30μm and width of 100-150μm.