日本マイクログラビティ応用学会誌
Print ISSN : 0915-3616
Technological Development of Highly Accurate Diffusion Coefficient Measurement by Shear Cell Method in Germanium Semiconductor Melt
Hirohisa ODA Shin-ichi YODATomihisa NAKAMURATadahiko MASAKINaokiyo KOSHIKAWASatoshi MATSUMOTOAkira TANJIMinoru KANEKOYoshito ARAIKazumasa GOTONatsumi TATEIWA
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ジャーナル オープンアクセス

1999 年 16 巻 1 号 p. 33-

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抄録
The shear cell method is a diffusion coefficient measuring method which facilitates measuring diffusion coefficient accurately. The shear cell method was developed in this investigation. A preliminary investigation using fluid simulation was performed to determine the best shear cell cartridge design. Diffusion coefficient of a germanium semiconductor melt was measured in microgravity environment using this shear cell cartridge. The experiment temperature was 1200°C, the experiment time was 357 sec. These experiment conditions were selected to fully utilize the microgravity environment in a sounding rocket. The concentration distribution of the experiment sample was measured by SIMS after flight experiment. The diffusion coefficient was calculated to be 1.94 x 10- 4 cm2 / s from the results. Technological development of shear cell method was thus achieved in this experiment.
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© 1999 The Japan Society of Microgravity Application
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