Journal of the Ceramic Society of Japan (日本セラミックス協会学術論文誌)
Online ISSN : 1882-1022
Print ISSN : 0914-5400
ISSN-L : 0914-5400
パルスレーザーデポジション法によるBaTi0.91(Hf0.5, Zr0.5)0.09O3薄膜の作製と強誘電体特性
掛本 博文柿本 健一馬場 明藤田 成隆増田 陽一郎
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2001 年 109 巻 1272 号 p. 651-655

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BaTi0.91(Hf0.5, Zr0.5)0.09O3 thin films were formed on Pt(111)/Ti/SiO2/Si(100) substrates by pulsed laser deposition using fourth-harmonic-generated light (λ=266nm) of a Nd3+: YAG laser beam. Crystallinity and stoichiometry of the thin films were determined by X-ray diffraction, X-ray fluorescence analysis and electron probe microanalysis. Their ferroelectric properties were investigated from electrical measurements. The leakage current density increased from 10-11 to 10-3 A·cm-2 with increasing electric field up to 200kV·cm-1. The dielectric constant, remanent polarization and coercive field of the BaTi0.91(Hf0.5, Zr0.5)0.09O3 thin films were estimated to be 120 at 1kHz, 8.7μC·cm-2 and 127kV·cm-1, respectively.

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