直流マグネトロンプラズマCVDにより形成した酸化スズ薄膜の光学及び電気的性質に及ぼす基板温度の影響

抄録

Effect of substrate temperature on optical and electrical properties of tin oxide thin films prepared by plasma CVD using DC magnetron discharge are discussed. A high density plasma (≅4×10¹¹cm^-3) improved the quality of the films. By heating the substrate at 170°C, the films has higher optical and electrical characteristics (optical band gap: 3.5eV, conductivity: 4S/cm, carrier concentration: 2×10²⁰cm^-3). When the films prepared at 90°C and 200°-500°C, both transmittance and conductivity decreased. These properties changed depending on crystal structure (amorphous, oriented) and an impurity.