抄録
Generally, Tin-doped indium oxide (ITO) has been used as a transparent conductive films for the flat panel display (FPD) . The resistance of ITO, however, must be decreased along with the expansion of a screen size of a display. One of the attractive methods to increase the conductivity without decreasing transmittance is the electroless nickel plating at the fringe of the ITO patterns. Selective metallized films at the fringe areas of the ITO films can be formed by dipping to a diluted PdCl2 solution as an initiator of electroless nickel plating on ITO. Furthermore, the addition of tartaric ions to the diluted PdC12 solution as an catalyst with accelerate the selectivity, because Pd ions form a complex with tartaric ions, which decreases Pd adsorption amounts on ITO.
