日本結晶成長学会誌
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
シリコン固液界面における酸素の偏析現象
柿本 浩一尾添 紘之
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ジャーナル フリー

1997 年 24 巻 2 号 p. 82-

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The incorporation of oxygen into silicon single crystals from the melt is examined in terms of an experiment and a model on a transient solidification. A transient analysis is proposed to obtain equilibrium segregation coefficient of oxygen in silicon and diffusion constant of oxygen in the melt almost independently. The analysis estimated these values of equilibrium segregation coefficient of oxygen in silicon and diffusion constant of oxygen in silicon melt.

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© 1997 日本結晶成長学会
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