音声言語医学
Online ISSN : 1884-3646
Print ISSN : 0030-2813
ISSN-L : 0030-2813
小型拡散型半導体を用いた声門下圧測定法
渡辺 宏小宮山 荘太郎西納 真介金苗 修一郎
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1978 年 19 巻 3 号 p. 224-227

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Subglottal pressure during phonation is varied with the opening and closing of the glottis. This fine wavy variation accompanied by the glottal vibration is termed as subglottal pressure variation.
A miniature transducer was inserted into subglottal region, and subglottal pressure variation as well as mean subglottal air pressure (DC component) was recorded. This study was carried out in order to observe pattern variation caused by changes in vocal intensity and/or pitch. The dimensional size of the miniature transducer was 3.0×3.0×1.0 mm. The wave form of subglottal pressure variation was triangular, having a flat section between each wave.
In the case of normal speech range, higher pitches of the voice resulted in shortening or finally disappearance of the flat section. However, no disappearance of the flat section was obtained when the vocal intensity was increased.
It was evident that theses modes of subglottal pressure variation mentioned above was influenced by the changes in vocal vibratory pattern during phonation.

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