磁場に反応する新しい機能性流体を用いたフロートポリシングの研究

抄録

This report describes one of several new float polishing techniques with large clearance utilizing a newly developed magnetic responsive fluid, a magnetic compound fluid (MCF) developed by one of authors. In the present study, MCF was improved by the addition of α-cellulose, achieving a large clearance in float polishing. The present study utilized two float polishing tools, each producing a different kind of polishing motion. The polishing results show a finely polished, mirror-like surface with nm-order R_a for various kinds of material. The mechanism of the new polishing technique is explained in terms of a magnetic cluster model. In addition, the MCF float polishing effect is investigated by the fluid behavior on the polishing tool, normal stress, shear stress and behaviors of abrasive and magnetic particles in the fluid experimentally. The MCF float polishing effect depends on the large shear stress and behaviors of abrasive and magnetic particles. The results obtained by this polishing technique are also compared to those obtained using ordinary magnetic responsive fluids, i.e., magnetic fluid or magneto-rheological fluid.