Journal of the Japan Society for Precision Engineering
Online ISSN : 1882-675X
Print ISSN : 0912-0289
ISSN-L : 0912-0289
Lecture
Technology Trend of Polishing Pad for CMP
Akira ISOBE
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Keywords: CMP, polishing, pad, slurry, suede, LSI, HDD, sapphire, LCD, glass, TSV
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2012 Volume 78 Issue 11 Pages 937-940

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