精密工学会誌
Online ISSN : 1882-675X
Print ISSN : 0912-0289
ISSN-L : 0912-0289
電解コンデンサ用アルミニウム電極箔のトンネルエッチングにおけるピット成長
牧野 英司矢島 宇生菅沼 榮一
著者情報
ジャーナル フリー

1989 年 55 巻 9 号 p. 1633-1638

詳細
抄録

The dissolution behavior on the tip and on the wall of tunnel pits formed on aluminum during DC etching in hot HCl solutions was studied. Initiated pits grow into a tunnel by crystallographic and auto-catalytic dissolution on the tip, independent of both the pH and the chloride ion concentration of a bulk solution. The tip dissolution proceeds under diffusion control at a rate of several μm/s, and then the tunnel growth abruptly stops at a limiting length when the tunnel tip may be repassivated. Although the tunnel walls must be passive during etching, they are subjected to general dissolution because of a high etching temperature. The tunnel widths increase continuously at a rate of several nm/s and the square cross section of the tunnels changes to circular shape.

著者関連情報
© 社団法人 精密工学会
前の記事 次の記事
feedback
Top