New fabrication methods referred to elastic emission machining (EEM) and plasma chemical vaporization machining (CVM) together with a new figure testing method based on stitching interferometry were applied to prepare the ultraprecise hard x-ray mirror optics. A steeply aspheric ellipsoid mirror for micro-focusing was fabricated and found to achieve nearly diffraction-limited performances. The focusing properties were predicted wave-optically from the measured surface profiles and compared to the observed results. They were in so good agreement that all factors such as incident beam coherency, beam profile measurement, mirror shape metrology and fabrication technology were concluded to be all in the advanced levels.
