日本応用磁気学会誌
Online ISSN : 1880-4004
Print ISSN : 0285-0192
ISSN-L : 0285-0192
薄膜
Xeイオン注入NiFe薄膜 −Xeの挙動と磁性
植松 健一塚原 園子岩嶋 輝明田上 尚男
著者情報
ジャーナル オープンアクセス

1989 年 13 巻 2 号 p. 269-272

詳細
抄録
A systematic experiment on xenon ion implantation into permalloy films was made in order to understand the effects of implantation of heavy inert ions on microstructures and magnetic properties. Xenon ion implantation always caused crystallization of the partially epitaxially grown permalloy film, so that the grain size increased. In addition, spherical bubbles were clearly observed even at low fluence in slightly defocussed TEM image. The bubble size varied to several 10 A with the fluence. In an electron diffraction pattern a weak extra halo ring became visible when the fluence exceeded about 6×1016/cm2. Magnetization measurement showed a large decrease in Ms and Meff when the fluence increased. Origin of the decrease of magnetization was discussed in relation to xenon bubble formation, and is probably attributable to a decrease of magnetization of permalloy atoms on the bubble surface.
著者関連情報
© 1989 (社)日本応用磁気学会
前の記事 次の記事
feedback
Top