抄録
Using ECR plasma assisted-sputtering, epitaxial growth of YBa2Cu3C7−x films with c-axis orientation were accomplished on a (100) SrTiO3 substrate. The YBa2Cu3C7−x films prepared by the ECR plasmaassisted sputtering exhibited a shorter lattice constant c and a higher Tc than those prepared by magnetron sputtering only. To investigate the relationship between the superconducting properties of the films and the plasma species in the ECR plasma, measurements of an optical emission spectroscopy during deposition were made. The superconducting properties of the films were closely related to the activated particles of oxygen in the ECR plasma.
