Abstract
The DNA damage caused by TiO2 under in vitro conditions by UV-A exposure in the presence of anionic vesicles of Aerosol OT (AOT) was investigated. The supercoiled form (S) in DNA plasmids was converted to the linear form (L) via the relaxed form (R). The DNA damage was slower in the presence of AOT vesicles prepared in aqueous NaCl solution. Moreover, the presence of AOT vesicles in solution after 6 h of UV irradiation was confirmed with an optical microscope. Probably, a fraction of the DNA was protected by random trapping during sonication. However, the addition of NaCl needed for the vesicle formation can decrease the TiO2 activity. On the other hand, in the absence of vesicles the NaCl concentration led to a profound influence on the adsorption of DNA onto the TiO2 surface. During UV irradiation, the degradation rate of DNA increased with increasing the salt concentration.
Solutions containing vesicles were prepared at various NaCl concentrations between 10 mM and 75 mM. Consequently, the salt concentration had no significant effect on the DNA damage. The presence of NaCl can play a deleterious role during the photoinduced process. However, the encapsulation of a fraction of DNA is not excluded. In such conditions, the DNA could be protected against the reactive oxygen species.
