抄録
The magnetostriction constant λ of thin nickel film is determined by microwave resonance. A thin sheet of glass on which a thin film is deposited is pulled through a nylon string. The uniaxial stress σu* applied in this way to the film gives a resonance field shift. The value of λ can be determined from the resonance field shift in the film plane in the case σu* is parallel to the easy axis of the film (method I), and also from the angular dependence of the resonance field shift as function of σu* (method II). It is found that the value of λ for nickel films is very close to the isotropic magnetostriction constant of bulk nickel: The values obtained for a film 1,450 Å thick are −36.3×10−6 (method I) and −(35.9±0.8)×10−6 (method II); the value for another film of 1,400 Å thickness is −38.7×10−6 (method I).
