Depth Profiling of Perhydoropolysilazane Thin Film Using Multi Anode XPS Technique

抄録

  The depth profiling of perhydoropolysilazane(PHPS) thin films on Si wafers were investigated by multi anode x-ray photoelectron spectroscopy (XPS) which has four x-ray anodes such as Mg, Zr, Ag and Ti . As the excitation energy of x-ray become higher, the information depth is more deepened. So it is possible to non-destructive depth profiling analysis of PHPS films by using multi anode XPS. It was found that the PHPS films to convert to silica occur not only on surface but also in sample inside by means of thermal treatment.