Journal of Surface Analysis
Online ISSN : 1347-8400
Print ISSN : 1341-1756
ISSN-L : 1341-1756
エクステンディド・アブストラクト
Calculation of Depth Distribution Functions for CuO and SiO2
H. ShinotsukaH. YoshikawaS. Tanuma
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2009 年 15 巻 3 号 p. 317-320

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  The emission depth distribution functions of photoelectrons for copper oxide CuO and silicon dioxide SiO2 were calculated by the use of the first-principle quantum mechanical multiple scattering theory. The results were compared with the approximated analytical expressions from the Boltzmann equation by Tilinin et al.. The former explicitly takes the details of atomic arrangement in solids into account, while the latter does not. We show the calculated results by the use of two approaches and how the elastic scatterings affect the depth distribution function.

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© 2009 The Surface Analysis Society of Japan
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