抄録
Monte Carlo (MC) simulations for microbeam analysis, in which the author has been involved for 45 years, are retrospectively reviewed by tracing the development of simulations models for describing complicated scattering processes of incident projectiles (electron, ion, etc.) in matter. The simulation model is based on the uses of theoretical expressions which describe elastic and inelastic scattering, respectively, no matter whether incident projectile be electron or ion.
MC simulation modellings of different types are outlined by presenting applications to microbeam analysis with primary electrons and ions, respectively, drawing attention into the close correlation between a new modeling and a new micoanalytical instrumentation that was marketed at different times.
Finally, the author takes a liberty to propose an international cooperative joint work for database construction of secondary electron yield, by introducing the working group activities which the JSPS-141 committee (microbeam analysis) has supported since 2009.
