Journal of Surface Analysis
Online ISSN : 1347-8400
Print ISSN : 1341-1756
ISSN-L : 1341-1756
Applications I (semiconductor, metal, ceramic, composite, etc.)
Fabrication of Rh Nanoparticle and Adsorption Reaction with DMS Studied by NEXAFS and XPS
H. Niwa S. OgawaK. NakanishiG. KutlukT. OhtaS. Yagi
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ジャーナル フリー

2011 年 17 巻 3 号 p. 278-281

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抄録
We have studied the adsorption reaction of DMS on the Rh nanoparticle fabricated by the gas evaporation method by using AFM, XPS and NEXAFS techniques. The AFM result shows that we can fabricate the Rh nanoparticle which has a small diameter with a small distribution and high dispersion of it by the gas evaporation method with the Rh wire as an evaporation source. The Rh L3-edge NEXAFS spectra indicate that the surface and bulk of Rh nanoparticle is stable in the chemical state of Rh0 despite the exposure to air. The Rh 3d XPS and S K-edge NEXAFS results show the lower degree of oxidized Rh nanoparticle has the stronger bonding with atomic S than the more oxidized one.
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© 2011 by The Surface Analysis Society of Japan
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