The 78th JSAP Autumn Meeting 2017
Session ID : 7p-A402-4
Conference information
Host: The Japan Society of Applied Physics
Name : JSAP Autumn Meeting
Number : 78
Location : [in Japanese]
Date : September 05, 2017 - September 08, 2017
Molecular dynamics simulation of SiO2 atomic layer etching by fluorocarbon plasmas and Ar plasmas
Details
Article 1st page
