The 78th JSAP Autumn Meeting 2017
Session ID : 7p-A402-6
Conference information
Host: The Japan Society of Applied Physics
Name : JSAP Autumn Meeting
Number : 78
Location : [in Japanese]
Date : September 05, 2017 - September 08, 2017
Improvement of Etching Process Distribution Controllability within a Wafer by Multi Gas Injection System
Keywords:
7p-A402-6,
Plasma Etching Apparatus,
Plasma Distribution Uniformity Control,
Gas Velocity Distribution Control
Details
Article 1st page
