The 68th JSAP Spring Meeting 2021
Session ID : 19a-Z24-4
Conference information
Host: The Japan Society of Applied Physics
Name : JSAP Spring Meeting
Number : 68
Location : [in Japanese]
Date : March 16, 2021 - March 19, 2021
A Study of dry etching process of Silicon oxide film using Minimal Fab
*Hiroyuki Tanaka, Yoshiyuki Nozawa, Toshihiro Hayami, Sommawan Khumpuang, Shiro Hara
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