IIP情報・知能・精密機器部門講演会講演論文集
Online ISSN : 2424-3140
セッションID: 2116
会議情報
2116 SiO_2皮膜の金電極を有するAFMプローブの開発(要旨講演,一般セッション:マイクロナノメカトロニクス)
倉永 大資細木 真保橋口 原
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会議録・要旨集 フリー

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抄録
We have developed a new fabrication method of electro-chemical probe for scanning electro-chemical microscopy. In our method, a SiN film, which is used for a mask layer of successive LOCOS (Local Oxidation of Silicon) process, was deposited on a Si{100} wafer and patterned at bottom of an anisotropically etched pyramidal hole. Following LOCOS process formed a SiO2 film except for the area of the SiN film. After removing the SiN film, a gold layer was deposited and patterned; which was then covered with a sputtered SiO2 layer. Final Si substrate etching completed the process. Using this process, we have successfully formed an electro-chemical cantilever which has a small gold probe covered with SiO2 film except for the tip of the probe having the radius of nanometer order.
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© 2008 一般社団法人 日本機械学会
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