抄録
A new nanoscale processing technique using a micro jet induced with an alternating electric field is proposed to enhance a semiconductor manufacturing technology and a bio-nano technology. For example, this micro jet can be applied for polishing process with nano diamond. In this study, the fundamental characteristics of the micro jet formation are investigated with micro PIV method. The micro jet which has successive circulation flows is induced with alternating electric field from a neighboring area of the point electrode. Furthermore, the threshold conditions of the electric field to generate the micro jet are demonstrated.
