Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21
Online ISSN : 2424-3086
ISSN-L : 2424-3086
セッションID: B010
会議情報
B010 Measurement of contact potential difference and material distribution by using an SEFM
Keiichiro HOSOBUCHIZhigang JIASo ITOYuki SHIMIZUWei GAO
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This paper presents a novel method for the measurement of the contact potential difference (CPD) and material distribution over the sample surface using scanning electrostatic force microscope (SEFM). Since the intensity of electrostatic force generated between the probe and the sample surface is relied on the differences of the CPD, the CPD can be calculated by using the frequency shifts of the probe oscillation when two different bias voltages are applied between tip and the sample. The detection sensitivity corresponding to the experimental conditions has been confirmed by simulation. In addition, the basic characteristic of the CPD measurement system has been evaluated.
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© 2013 一般社団法人 日本機械学会
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