Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21
Online ISSN : 2424-3086
ISSN-L : 2424-3086
セッションID: D013
会議情報
D013 Development of a structure with variable thermal conductivity using an electro-adhesive gel
Kunito KONISHITojiro AOYAMAHidenobu ANZAIHiroharu SAKURAI
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The demands for manufacturing thin silicon wafers have increased following the advancements in technology. To increase product efficiency and accuracy of semiconductors, a new method for holding the silicon wafer is required. An electro-adhesive gel (EAG) is a new material developed as a functional material applied to hold the devices. The EAG can change its surface adhesion properties depending on the applied electric field. Based on the structure of the EAG, a new function that can change its thermal conductivity is developed. The new function is expected to enable quicker cooling of the wafer, leading to a more efficient manufacturing process. From the experiment the EAG can change its thermal conductivity for about 20%.
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© 2013 一般社団法人 日本機械学会
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