Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21
Online ISSN : 2424-3086
ISSN-L : 2424-3086
セッションID: 2108
会議情報
2108 Study on dynamic observation method for fine particles during Chemical Mechanical Polishing using optical transparency micro-patterned pad
Takahiro OnikiPanart KhajornrungruangKeisuke Suzuki
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Transparency micro-patterned pad, which have high transmittance at the visible wavelength region and low refractive index equivalent to water, has been developed to observe particle movement during lapping and polishing process directly. The fundamental geometry of the micro pattern has a trapezoidal pyramid shape having the base width of 6.97μm, the height of 2.40μm and the pitch of 12.00μm. In the case of transparency micro-patterned pad at low diffraction index, pyramid pattern contrast in the observation image could be eliminated by filling water between the transparency micro-patterned pad and glass substrate. Therefore, we succeeded observation on the movement of diamond particles by light scattering without interference from the transparency micro-patterned pad pattern. This observation results suggest that the transparency micro-patterned pad would be a useful tool for the dynamic observation directly during the lapping and polishing.
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© 2015 一般社団法人 日本機械学会
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