抄録
High power impulse magnetron sputtering (HIPIMS) deposition technique is an ionized PVD process, which applies pulsed power of low duty cycle (<10%) and frequency (<10 kHz) to sputtering target resulting in high target power densities of several kW cm^<-2>. A number of studies has reported the advantageous features of HIPIMS deposited films, such as dense and smooth surface, and three-dimensional uniformity on complex-shaped substrates. In view of its application to micro-precision stamping die, the present study focuses on the durability of hard coating films deposited by HIPIMS process. TiAIN films were deposited by both HIPIMS and conventional direct current magnetron sputtering (dcMS) on the high speed steel substrates. A scratch test and ball-on-disc type tribology test were perfomed to invesitgate its adhesion strength on the substrates and wear resistance, respectively. As results, the higher value of critical load in scratch test (L_c=60N) and the lower wear rate of w_s=5.74×10^<-14> m^3/Nm was obtained for HIPIMS deposited films compared with that for the conventional dcMS process. The applicability of the advantageous features of HIPIMS deposition TiAIN films to the micro-precision stamping dies are experimentally demonstrated.
