年次大会講演論文集
Online ISSN : 2433-1325
セッションID: 811
会議情報
811 2つの円筒状物体への熱CVDプロセスにおける数値シミュレーション(G06-2 熱物性・加工,G06 熱工学)
小田 慎一郎田之上 健一郎西村 龍夫高橋 浩司
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会議録・要旨集 フリー

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抄録
Chemical vapor deposition (CVD) has widely been utilized for reforming cutting-tools on a surface. CVD is a method that metal- or metallic oxide- or semiconductor- thin film is deposited on a surface of a primary material through a chemical reaction in a gas phase. There are many reports for CVD on a flat plate. However, there are few reports that investigate CVD process around objects like cutting-tools because the process involves common CVD process and furthermore complex heat- and mass- transfer around the objects. In this report, CVD process around some columnar objects in cylindrical flow channel locally heated from side wall has been studied by using 2D numerical simulation.
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© 2005 一般社団法人日本機械学会
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