抄録
Chemical vapor deposition (CVD) has widely been utilized for reforming cutting-tools on a surface. CVD is a method that metal- or metallic oxide- or semiconductor- thin film is deposited on a surface of a primary material through a chemical reaction in a gas phase. There are many reports for CVD on a flat plate. However, there are few reports that investigate CVD process around objects like cutting-tools because the process involves common CVD process and furthermore complex heat- and mass- transfer around the objects. In this report, CVD process around some columnar objects in cylindrical flow channel locally heated from side wall has been studied by using 2D numerical simulation.