抄録
Integration of a grating-imaging-type encoder is proposed and the sensor for the encoder has been fabricated using Si micromachining technology. The sensor consists of the Si grids and line photodiodes. The Si grids work as the object grating The incoherent light emission through the Si grids and the light detection with the line photodiodes make the optical system compact. Moreover, the photodiode array based on the M-series arrangement is also installed on the same substrate for zero-point detection.
