抄録
At present, it is afraid of a limit of photolithography in the semiconductor field again to the requirement of which becomes rapidly minute electron beam lithography technology attention. As for the field as well, downsizing is the flow of the necessity as well as this except for the micro-machine which advanced micro-machining technology should lithography be necessary, the optical communication and so on we development research and development electron beam device use. So, the outline of the development device, an application example, and so on are shown about the study on the various adaptation fields that we advance it at present that report.
