抄録
In order to obtain ideal flatness and surface roughness of glass substrate disk, a new finishing method with micro-patterned hard asperities was fundamentally studied. An anisotropic etching process has possibility to produce the surface covered by silicon abrasive asperities of extremely well defined shape and size. Different height and apex angle of asperities were produced by the changing of etching time before and after removal of SiO_2 coating during etching process. The height and apex angle of asperities were uniform on the surface. The height of asperities was controlled in sub-micron meter order. The apex angle of asperities was controlled from 40 to 164 degree. Glass convex specimens were scratched with these asperities in different shape. The depth of the groove for glass specimen decreased with apex angle of asperities. These results show the possibility of this new finishing method for glass substrate.
