生産加工・工作機械部門講演会 : 生産と加工に関する学術講演会
Online ISSN : 2424-3094
会議情報
319 SOG をマスクとしたシンクロトロン放射光による微細加工
谷口 淳竹澤 悟神田 一浩松井 真二宮本 岩男
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会議録・要旨集 フリー

p. 219-220

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抄録
We found that Spin On Glass (SOG) material acts as positive-type electron beam resist, and fine line pattern was obtained using electron beam exposure and following buffered HF development. Thus, SOG is the candidate material for high aspect ratio and fine pattern mask to organic materials such as polymethylmethacrylate (PMMA) by synchrotron radiation (SR) exposure. In this report, etching of PMMA by SR using SOG mask was examined. The SR, which emitted rom BL6 at the New SUBARU in Himeji Institute of technology, exposed to PMMA thorough SOG mask with fire patterns at room temperature. As a result, SOG mask layer was etched 263nm by SR and PMMA was etched 355nm by SR. Therefore, SOG was effective mask for PMMA, and this process would be able to do LIGA process without development.
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© 2002 一般社団法人 日本機械学会
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