電子軌道解析による大面積電子ビーム照射現象の基礎的研究

抄録

In large-area electron beam (EB) irradiation method, uniformly high energy EB can be obtained without focusing the beam. Large-area EB can be used for melting and evaporating metal surface instantly. Furthermore, the tip of convex shape is often rounded after large-area EB irradiation with remarkable material removal at the tip. This phenomenon is probably caused due to the electrons concentration at the tip. However, electrons behavior near the workpiece surface during large-area EB irradiation has not yet been clarified. In this study, electron track analysis was conducted in order to clarify electrons behavior during large-area EB irradiation. At first, analytical model of the large-area EB irradiation apparatus was built. Then, the EB diameter on the workpiece surface was experimentally measured with different energy density in order to evaluate the accuracy of our analytical model.