Host: The Japan Society of Mechanical Engineers
Name : [in Japanese]
Date : June 08, 2016 - June 11, 2016
Direct laser writing (DLW) based on two-photon microstereolithography has been used for many kinds of application fields such as MEMS and lab-on-a-chip. In this study, we have developed an ultrafast multiscale two-photon microstereolithography system by using spatial light modulation technique. An optical vortex generated by a spatial light modulator (SLM) is used for changing the linewidth in the range from 1 to 3 micrometers. The combination of scalable resolution and contour scanning method made it possible to reduce the fabrication time for making large-scale models such as a bunny model. In addition, we utilized two SLMs for nanolithography based on laser-induced deactivation of photopolymerization to realize sub-100 nm resolution.
