材料
Online ISSN : 1880-7488
Print ISSN : 0514-5163
ISSN-L : 0514-5163
解説
高指数面上の副格子交換エピタキシーと面型非線形光デバイス
北田 貴弘盧 翔孟南 康夫熊谷 直人森田 健
著者情報
ジャーナル フリー

2019 年 68 巻 10 号 p. 739-744

詳細
抄録

Sublattice reversal has been successfully demonstrated in GaAs-based III-V semiconductors on high-index substrates. A thin layer of Ge was introduced as a group IV material during molecular beam epitaxy of GaAs or AlAs layers on the (113)B- or (113)A-oriented GaAs substrates. The sublattice reversal was realized over the entire wafer area when GaAs/Ga/AlAs system was deposited on the (113)B substrate while it was not realized on the (113)A substrate. On the other hand, the sublattice reversal was completely realized for AlAs/Ga/AlAs system on the (113)A substrate and not on the (113)B substrate. These situations may be explained by self-annihilation of antiphase domains whose boundaries are composed of inclined (111) bond planes. The growth technology of the sublattice reversal epitaxy can be applied to novel kinds of planar-type nonlinear optical devices, which require a polarization-inverted structure in order to satisfy the quasi-phase-matching condition for the second-order nonlinear signal. Here, we will discuss on surface-emitting terahertz devices based on a semiconductor coupled multilayer cavity.

著者関連情報
© 2019 日本材料学会
前の記事 次の記事
feedback
Top