明視野顕微鏡における像コントラスト向上技術

—回折光の偏光を利用した欠陥顕在化技術—

抄録

The ever-increasing improvement in the speed, scale and function of electron devices is attributed to the rapid spread of information by society. In an effort to meet the demands for improvement in the sector of electron device technology represented by semiconductors, inspection with high sensitivity for complicated patterns is desirable. Herein, we report optical inspection technology aimed at high sensitivity inspection, which is expected to have applications to bright-field systems. Effective detection method of high order diffracted light using polarization control is described. This method was verified to have high contrast detection sensitivity for defects.