抄録
This study is intended to develop a machining cantilever for use of nanofabrication method called tribo-nanolithography (TNL). In the TNL method, diamond tip with an arbitrary tip radius is necessary to fabricate precise nanostructure. To control the shape of cutting edge, anisotropic and subsequent isotropic wet etching method is applied in a fabrication process of silicon mold. The tip radius increases with an increase in time of isotropic wet etching, and diamond tip with arbitrary tip radius can be fabricated. Nanomachining experiment using friction force microscopy (FFM) is conducted to evaluate developed cantilever as a nanomachining tool for the TNL. As a consequence, silicon surface can be machined without removal, and this indicates possible use for the TNL. SEM observation reveals that there are a number of particles on the cutting edge that lead a negative influence on the machined area, and they could be improved by increasing machining distance, owing to the wear and/or drop of the particles. Finally, nanostructure with a line width of 120nm could be fabricated by the TNL using developed cantilever, and this indicates that the developed cantilever is effective nanomachining tool for the TNL.
