抄録
The present status of the development of light sources based on discharge for EUV lithography is reviewed. The discharges, such as Z-pinch, capillary discharge, plasma focus and hollow cathode discharge, are compared and their significant features are pointed out. The performance of each type of discharge is summarized.The plans and the present state of the development of EUV high sources at Tokyo Institute of Technology and Kumamoto University are briefly described.
